发明名称 |
Method of making p-i-n photodiodes |
摘要 |
Photodiodes (10) are fabricated in a single step diffusion process which exploits the characteristic of certain acceptors to form an anomalous diffusion profile (VI) including shallow and deep fronts (VIa and b) joined by an upwardly concave segment (VIc). By performing this type of diffusion into a low-doped n--type body (12) with a carrier concentration (VII) below that of the concave segment, a p+-p- junction (15) is formed at the depth of the concave segment and a p--n- junction (17) is formed at a greater depth. The zone (16) between the junctions is at least partially depleted and forms the active region of a p+-p--n- photodiode. Specifically described are InP:Cd photodiodes.
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申请公布号 |
US4477964(A) |
申请公布日期 |
1984.10.23 |
申请号 |
US19830538182 |
申请日期 |
1983.10.03 |
申请人 |
AT&T BELL LABORATORIES |
发明人 |
CHIN, ALAND K.;DUTT, BULUSU V. |
分类号 |
H01L31/0304;H01L31/105;(IPC1-7):H01L29/16;H01L29/90;H01L27/14 |
主分类号 |
H01L31/0304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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