发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To obtain an image easily soluble and high in gradation reproducibility, and high in contrast by using a specified photosensitive polyvinylalcohol deriv. mixed with a wax emulsion. CONSTITUTION:A PVA deriv. used as a photosensitive element has 200-4,000 main chain polymn. degree and 70-98mol% saponification degree, and contains styryl-pyridinium or styrylquinolinium groups as polymn. monomer units in an amt. of 0.3-40mol% of the total monomer units. Said PVA has formula I in which Y is formula II or III; R1 is alkyl or aralkyl optionally substd. by at least one of OH, CONH2, or a group having an ether bond or unsatd. bond; R2 is H or lower alkyl; X<-> is an anion; (m) is 0 or 1; and (n) is 1-6. Such a photosensitive element is mixed in a wax emulsion in a weight ratio of (1/0.5)-1/5. Further, 0.01-1wt% colloidal soln. of silicic acid anhydride polymer represented by the formula: XSi(OR)3 (X being amino, vinyl, or the like, and R being methoxy or the like) to enhance adhesion of an image part and its physical strength.
申请公布号 JPS59185332(A) 申请公布日期 1984.10.20
申请号 JP19830059224 申请日期 1983.04.06
申请人 KOGYO GIJUTSUIN (JAPAN);OUJI SEISHI KK 发明人 ICHIMURA KUNIHIRO;TOYOFUKU KUNITAKA;MORITA YASUYOSHI
分类号 C08L7/00;C08F8/00;C08F8/30;C08L21/00;C08L23/00;C08L29/00;C08L29/02;C08L101/00;G03F7/038;G03F7/075 主分类号 C08L7/00
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