| 摘要 |
PURPOSE:To decrease overshoot of a substrate temp. and to enable exact control of the substrate temp. by providing a preheating means for a temp. sensor and saturating thoroughly the temp. sensor prior to heating the substrate. CONSTITUTION:A vacuum deposition device consists of a temp. sensor 3 for detecting the temp. in a chamber 1, a means 4 for heating the substrate 2 in the chamber 1, a control means for controlling the substrate heating according to the temp. detected with the sensor 3, a preheating means 10 for the temp. sensor and a heat shielding means 12. The means 10 is provided near the sensor 3 independently from the means 4 for heating the substrate 2. The means 12 is provided near the sensor 3 in order to shut off the heat generated from the means 4. |
