| 摘要 |
PURPOSE:In the vapor-phase crystal growth equipment which is accompanied by volume change in the reactor tube, a means for compensating the volume change is provided to permit the stable growth of epitaxial crystal. CONSTITUTION:The main body of the reactor tube 9, which has two crystal- growing chambers U and D on the upper and lower sides where the base crystal 7 on the holder 6 is shifted from the upper chamber U to the lower one D by the movement of the plate 5, is equipped with the volume change compensator P composed of cylinder 10, bellows 11 and plate 12. As the base holder 6 moves, the plate 5 moves from A through B to C or from C through B to A to cause volume change. But, the volume change compensator P works to move the plate 12 upward or downward to effect accurate compensation of the volume change. Thus, the change in pressure inside the two crystal-growing chambers U and D is inhibited to minimize the composition change of epitaxial crystals caused by back flow of the gas or the like. |
