Method for polishing titanium carbide containing surfaces.

摘要

The method comprises the chemical-mechanical polishing of titanium carbide containing surfaces to a high degree of perfection. The titanium carbide containing surfaces are continuously wetted with a water slurry containing a soft abrasive material. The continuously wiping of the titanium carbide surface is accomplished with a firm surface (16) using pressure while maintaining a relative movement between the titanium carbide containing surface and the firm surface (16) to remove the water reacted titanium carbide product from the high points of the titanium carbide containing surface. This method is continued until a high degree of perfection of the surface is accomplished. The slurry is typically composed of colloidal silicon dioxide dispersed in water. The titanium carbide surface can also include aluminum oxide as a constituent. Where aluminum oxide is present it is preferred to have about 60 to 80% aluminum oxide and 40 to 20% titanium carbide by weight in the surface structure.