发明名称 SURFACE TREATMENT METHOD OF MAGNETRON
摘要 PURPOSE:To aim at streamlining a manufacturing process ever so simple, by surrounding a magnetron body with a bell jar being filled up with hydrogen gas and removing an oxidation film produced on the outer surface of a metallic part owing to hydrogen reducing action while the metallic part of a body drops its temperature down from the specified temperature in an exhaust process. CONSTITUTION:Plural magnetron bodies 8 are supported and locked to a manifold 7 on top of an exhaust cart 6 which moves in succession. Then, among exhaust processes in time of manufacturing these magnetrons, a bell jar 9 being filled up with hydrogen gas is covered over these magnetron bodies 8 in exhaust operation and moved together in a process between whiles temperature drops to nearly room temperature (about 50 deg.C) from a range of 300-580 deg.C at the final process, and thereby an oxidation film produced on the surface of a metallic part of each magnetron body 8 is removed by means of hydrogen reducing action.
申请公布号 JPS59181444(A) 申请公布日期 1984.10.15
申请号 JP19830056010 申请日期 1983.03.31
申请人 TOSHIBA KK 发明人 TADA ISAO
分类号 H01J9/38;H01J23/00;H01J23/12 主分类号 H01J9/38
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