PROCESS FOR PRODUCING THIN LAYERS ON SUBSTRATES BY CATHODIC SPUTTERING

摘要

The present invention provides a method for the manufacture of solid electrolyte layers for galvanic cells. In accordance with the method of this application, a very thin, firmly adhering, coherent layer of a lithium nitride halogenide is deposited on a substrate by virtue of atomizing the lithium nitride halogenide in a cathode sputtering system. The sputtering system is characterized by a discharge voltage of at least 300 volts and a pressure less than 1x10-1 mb. The system further comprises a plasma-generating gas which should be at least 55% by weight, based on the total weight of gases, helium and/or nitrogen.