发明名称 PHOTOENGRAVING METHOD BY PHOTOSENSITIVE RESIN
摘要 PURPOSE:To prevent roughening on a photoengraved surface as a result of a stripping operation by providing a water-soluble resin film layer on an exposing frame, forming an unexposed photosensitive resin layer on the film layer, removing the water-soluble resin film together with said layer from the exposing frame after exposing, washing the same without separating both and eluting the above-described water-soluble resin together with developing. CONSTITUTION:A water-soluble resin film layer is provided on an exposing frame, and a photosensitive resin plate is formed on said film layer. The resin plate is washed and developed after exposing and the above-described water-soluble resin film is eluted, by which the plate is photoengraved. Such photoengraving is accomplished by placing a positive plate 8 on a glass plate 2 of an exposing frame 1, placing a water-soluble film 3 thereon in tight contact with said plate, fitting spacers 4 into the inside surface of the frame 1, casting an unexposed photosensitive resin liquid between the spacers, superposing further a plate carrying plate 6 to the height of the spacers 4 then expelling air like arrows (a) and exposing the plate with a lamp group 9. The same is further accomplished by removing the plate 8, removing the one body of the spacers 4, the plate 6, the undeveloped photosensitive resin plate 5 and the water-soluble film from the frame 1, developing the same with a developing device, applying developing water 10 thereon and washig and developing the plate. Then the water-soluble film is dissolved and removed without the need for stripping and the unexposed part of the plate 5 is also washed away, by which the defective resolution is prevented.
申请公布号 JPS59177545(A) 申请公布日期 1984.10.08
申请号 JP19830052225 申请日期 1983.03.28
申请人 GOTOU HIROSHI 发明人 GOTOU HIROSHI
分类号 G03C1/74;G03F7/09;G03F7/11;G03F7/16;G03F7/26 主分类号 G03C1/74
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