| 摘要 |
PURPOSE:To easily obtain a thermal head having a comb shaped conductor layer without requiring highly precise mask alingnment, by a method wherein a resistor layer is deposited on a substrate while the conductor layer is deposited on the entire surface thereof and, thereafter, the condutor layer is successively etched by using three kinds of masks. CONSTITUTION:After a resistor layer 3 is deposited to a certain region of a substrate 1 by vapor deposition or sputtering, a conductor layer 3 is deposited on the resistor layer 2 so as to cover the entire surface of the substrate 1. In the next step, the conductor layer 3 is etched according to photolithographic tecnique by using a mask 11 having a window 12 and, subsequently, the resistor layer 2 is etched to form slit shaped opening parts 4 almost parallel to the conductor layer and the resistor layer. In addition, a mask 13 is used to perform mask alignment so that the oblique line part 14 thereof cross the opening parts 4 of the conductor layer 3 almost at right angles and the conductor layer 3 is etched in a strip form by photolithographic tecnique. Subsequently, a mask 15 is used to perform mask alignment at a position where the oblique line part 16 thereof is opposed to a connecting electrode H and the electrode H at the oblique line part 16 is removed by etching to obtain a thermal head having a comb shaped condutor layer 3. |
