发明名称 VERFAHREN ZUR HERSTELLUNG EINES MEHRKOMPONENTENDUENNFILMS, INSBESONDERE EINES AMORPHEN MEHRKOMPONENTENSILICIUMDUENNFILMS
摘要 A multicomponent amorphous silicon film suitable for a solar cell is produced at a higher deposition rate by a novel process comprising using jointly a sputtering method and a plasma CVD method within a pressure range of not lower than a pressure at which the maximum film formation rate is given in the sputtering method.
申请公布号 DE3411702(A1) 申请公布日期 1984.10.04
申请号 DE19843411702 申请日期 1984.03.29
申请人 DIRECTOR GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY MICHIO KAWATA 发明人 HITOTSUYANAGI,HAJIME;FUJITA,NOBUHIKO;ITOZAKI,HIDEO;KAWAI,HIROMU
分类号 H01J37/32;C23C14/00;C23C14/06;C23C14/14;C23C14/22;C23C14/34;C23C14/35;C23C14/36;C23C16/24;C23C16/50;C23C16/509;H01L21/203;H01L21/205;H01L29/16;(IPC1-7):C23C17/00;C23C11/02;B05D1/02;H01L21/20;H01L31/18;C23C15/00 主分类号 H01J37/32
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