| 摘要 |
PURPOSE:To deposit a vertical mangetization film by evaporation at a high speed on a low melting substrate as well and to obtain an excellent magnetic recording medium by depositing a non-magnetic Co alloy contg. a specific element by sputtering on the substrate at the same instant when Co or Co-Ni alloy is vapor deposited by electron beam thereon. CONSTITUTION:A film 1 having a low m.p. such as polyethylene terephthalate or the like is used as a substrate and said film is delivered along a rotary cooling support 3. While said film is moved from a roll 2 to a take-up roll 4, Co or Co- Ni alloy 8 is impulsively heated by the electron radiated from an electron ray generator 9, by which said alloy is deposited on the film 1 as a vapor flow 5. On the other hand, a non-magnetic Co alloy II contg. an element of one kind selected from Sm, Cr, Mo, W, V and Ru is deposited by evaporation in such a way that the alloy is distributed over the entire region of the film 1 exposed to the vapor flow 5, with said alloy as a sputtering cathode 10. The quick vapor deposition of Co or Co-Ni is thus made possible without sputtering and the component ratio is stably controlled by separately sputtering the additive alloy, by which the vertical magnetization recording medium having an excellent and uniform magnetic characteristic is obtd. with good productivity. |
