| 摘要 |
PURPOSE:To perform a good marking with the optimum averaging of the output of a laser beam and to enable the marking at high speed in large area by condensing a continuously oscillating laser beam linearly by the condensing member after enlarging it in the necessary width and by irradiating on the material to be marked with mutual movement through a mask. CONSTITUTION:The laser beam B1 of the laser oscillator enabling a continuous oscillation motion or the laser oscillator 1 with variable repeating speed of the oscillating pulse and the pulse width enabling a continuous pulse motion is irradiated on an enlarging concave lens 4 via the aperture 2 with condensing hole and a reflecting mirror 3 to make the beam B2 enlarging in the necessary width. This beam B2 is formed in a linearly focused beam B3 by a cylindrical beam condensing lens 5, irradiated on the material 7 to be marked through the stencil mask 6 made of metal to mark. A good marking on the whole face is performed by averaging the irradiated laser beam peak value output at the selected optimum value to enable the marking at high speed in large area by the output selection. The marking is performed by relatively moving either the mask 6 or the set P of the material 7 to be marked. |
