| 摘要 |
PURPOSE:To prevent the generation of pinholes, by providing a third electrode at the specific position of the apparatus wherein a cylindrical substrate and an opposed electrode are provided in a vacuum reaction tank equipped with a voltage applying means and a gaseous substance is decomposed by glow discharge to deposit a membrane on the substrate. CONSTITUTION:A thin film depositing apparatus is constituted of such a structure that a substrate 1 for electrophotography and an opposed electrode 2 are placed in a vacuum reaction tank 6 and a third electrode 5 is further provided at a position satisfying formulae I , II wherein VA, VB, VC are respectively potentials of the opposed electrode, the substrate and the third electrode, d1 is the closest distance of the substrate and the opposed electrode and d2 is the closest distance of the third electrode and the opposed electrode. In this state, DC voltage is applied between the opposed electrode 2, the third electrode 5 and the substrate 1 from a power source 4 to generate glow discharge and the gaseous substance from an introducing port 7 is decomposed to deposit a thin film on the substrate 1. |
