| 摘要 |
PURPOSE:To form an opacified pattern in an extremely stable state by arranging an energy-rays absorbing material on the transparent substrate face of the defective part of an opaque film, and irradiating energy rays. CONSTITUTION:Laser beams 14 are controlled in the diameter of the luminous flux with an aperture 15, and its flux incident on a substrate 11 is selected to be limited within a pinhole 13 occurring on a Cr film. A thermally changed region 17 is formed by irradiating the beams thus controlled, e.g. for <=about 0.1sec and heating the surface near the pinhole 13 of the substrate 11. The region 11 is opaque enough for UV rays or the like, and comes to have an effect correcting the defect of the opaque film of the photomask made of Cr. Further, the region 17 is formed in an extremely stable state by coating the pinhole 13, e.g. with a light absorbing material 18, such as carbon-contg. liquid or fine powder, and irradiating it with the laser beams. |
