| 摘要 |
PURPOSE:To enhance the sputtering rate, and at the same time, to enable to manufacture a thin film manetic material having a superior soft magnetic characteristic by a method wherein a magnet is put between a substrate holder and a target as to make the N pole and the S pole to face mutually interposing the prescribed distance between them, the direction of magnetic flux thereof is made to be nearly in parallel with the directions of the surface of the target and the surface of the substrate, and moreover the magnet thereof is rotated during sputtering. CONSTITUTION:The supporting base 13 of a magnet 12 is made as to be enabled to perform a low-speed rotation on a supporting base 15 provided thereunder and having bearings 14 according to a driving mechanism 16. Magnetic flux of the magnet 12 comes out from the N pole, a part thereof enters in a target 17, a part although a little enters in a magnetic material on a sputtered substrate 11, and go together toward the S pole. At this time, because the magnet 12 is rotated according to the driving mechanism 16, a rotating magnetic field is applied to the magnetic material on the sputtered substrate 1, and induction of magnetic anisotropy in the magnetic material film surface is checked to contribute to enhancement of the soft magnetic characteristic of the magnetic material. While, according to the rotation of the magnet 12, in addition to the fact that the target 17 surface is sputtered uniformly, concentration of plasma is enhanced according to the mgnetic flux when discharge is generated, and the sputtering rate is enhanced. |
