发明名称 POSITIVE TYPE PHOTORESIST COMPOSITION
摘要 PURPOSE:To improve the adhesion of a positive type phtoresist compsn. to a substrate by adding the compd. obtd. by esterifying partially the addition surface of a conjugate diene polymer and alpha,beta-unsatd. dicarboxylic acid or the anhydride thereof to said compsn. CONSTITUTION:A compd. obtd. by bringing a compd. having an alcoholic hydroxyl group into reaction with the adduct of a conjugate diene polymer and alpha,beta- unsatd. dicarboxylic acid or the anhydride thereof is added to a positive type photoresist compsn. contg. a quinone diazide compd. as a photosensitive agent. Such positive type photoresist compsn. has high definition and adheres securely to a substrate without peeling. The compsn. lends itself not only to a large scale integrated circuit having, for example, about 1mum patterns but also to processing of a shadow mask, a color filter for CCD, printed wiring, PS flat plate, etc.
申请公布号 JPS59170836(A) 申请公布日期 1984.09.27
申请号 JP19830045029 申请日期 1983.03.16
申请人 SUMITOMO KAGAKU KOGYO KK 发明人 HANABATAKE MAKOTO;FURUTA AKIHIRO;YASUI MASAAKI
分类号 G03C1/72;G03F7/022;G03F7/023;H01L21/027 主分类号 G03C1/72
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