摘要 |
PURPOSE:To remove the defect of hologram performance due to relative oscillation between the elements of a hologram exposure optical system by guiding a luminous flux to the interference part of an optical interference monitor system through optical elements used as the hologram exposure optical system in common. CONSTITUTION:The hologram exposure optical system 2 spectral splits the laser light of a laser tube 4 by a half-mirror 6 to illuminate a hologram dry plate 9 through an optical element 7 and an optical element 12. The optical interference monitor system 3 spectral splits light which is spectral split by a half-mirror 5 further by a half-mirror 14 to project the light passed through mirrors 8 and 15 and the light passed through a mirror 1 on a screen 17, forming interference fringes. Therefore, the exposure optical system 2 and the optical elements of the interference monitor system 2 are constituted partially in common, relative oscillation when occurring between the elements in the exposure optical system appears as the optical path difference and angle difference between two pieces of the luminous flux of the interference system 2, so that the dry plate 9 is treated as necessary by locking at the display of variation of the interference fringes on the screen 17. |