| 摘要 |
PURPOSE:To form easily a very small optical waveguide by sticking the oxide of one element among Cu, Cr, etc. to LiNbO3 which is an oxide single crystal then subjecting the oxide single crystal to a diffusion treatment with the oxide stuck thereon as a diffusion source. CONSTITUTION:The oxide of Cu, Cr, Ti, V, Ge, Si, Al, Mg, Zn, Mn, Fe, Co, Ni or Ag as a vapor deposition source or sputtering source is deposited by evaporation or sputtered on the optically polished surface of an electrooptic single crystal of LiNbO3 or LiTaO3 to form a thin film of the oxide. The crystal on which the thin film of said oxide is stuck is then subjected to a heat treatment at a high temp. Diffusion is thus effected in the crystal with the thin film of the oxide as a diffusion source, by which a desired diffusion layer is obtd. The thickness of the oxide to be stuck is made preferably >=500Angstrom . |
