摘要 |
<p>PURPOSE:To eliminate the need for a protecting film against fluoric acid and simplify the construction of a thermal head, by forming a thermal head in such a manner that a tantalum resistor is directly formed on a substrate coated with glass or quartz, and a wiring conductor is connected to the resistor. CONSTITUTION:On an alumina substrate 1 having a coating layer 2 of glass or quartz, a tantalum resistor thin film 4 and a wiring conductor thin film 5 are formed. Thereafter, a photoresist pattern is formed by a photoetching using an ordinary photoresist, whereby the wiring conductor 5 is etched into a stripe shape. The tantalum resistor thin film 4 is etched by a plasma etching using a gas containing fluorine atoms. The thickness of the coating layer 2 of glass or quartz is generally 20-100mum. Materials for the tantalum resistor thin film 4 include Ta-SiO2 cermet and Ta-Si cermet.</p> |