发明名称 METHOD FOR MEASURING FILM THICKNESS OF MINUTE AREA UTILIZING X-RAYS
摘要 PURPOSE:To make it possible to measure the film thickness of a minute area, by coating a material to be measured by a shield plate, which is formed by providing a hole or a slit having a minute area in an aluminum plate, and measuring the thickness of the film of said material to be measured by X-rays. CONSTITUTION:A fluorescent X-ray film thickness gage is set to a measuring area of 0.3phi, and a material to be measured is set on a measuring table. At this time, the material to be measured is coated by a shield plate 1, which is formed by providing a minute hole or a minute slit of 0.3phi in an aluminum plate. Then, specified measurement of the film thickness is performed. In this way, the problem of impossibility of performing accurate film thickness measurement before is solved, and the film thickness measurement of the minute area can be performed. Therefore, this method can be used for the performance check of plating on the minute area and the like.
申请公布号 JPS59168314(A) 申请公布日期 1984.09.22
申请号 JP19830043751 申请日期 1983.03.15
申请人 HITACHI DENSEN KK 发明人 YASHIRO SEIJI
分类号 G01B15/02;G01N23/223;(IPC1-7):G01B15/02 主分类号 G01B15/02
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