WATER-DEVELOPABLE PHOTOSENSITIVE SHEET HAVING HIGH LIGHT SHIELDING PROPERTY

摘要

PURPOSE:To obtain the titled photosensitive sheet suitable for use in the formation of a negative mask by forming a photosensitive film consisting of a specified water-soluble photosensitive resin of a photosetting PVA deriv. and a pigment or dye having no light absorbing power in the photosensitive wavelength region of said resin on a transparent support. CONSTITUTION:A water-soluble photosensitive resin of a photosetting PVA deriv. contg. photo-cross-linkable constituent units represented by the formula (where m is 0-6; n is 0 or 1; R1 is H or lower alkoxy; R2 is H or alkyl; and X is the anion of a strong acid) is used. A photosensitive film consisting of said resin having <=350nm maximum photosensitive wavelength and a pigment or dye having light absorbing power in the wavelength region of 370-400nm and transmitting light of <=350nm is formed on a sheetlike transparent support such as a transparent resin film or a glass sheet to obtain the titled photosensitive sheet. The sheet is exposed and developed by washing to form a desired pattern. This pattern is suitable for use as an original for a diazo photographic material having 370-400nm light absorption band.