发明名称 |
Integrated semiconductor circuit comprising bipolar down-diffused and up-diffused transistors, and process for producing it |
摘要 |
In an integrated semiconductor circuit comprising bipolar down-diffused and up-diffused transistors (for example T4, T1) in a semiconductor body, at least one common buried layer zone (71), which forms collectors of the down-diffused transistors or emitters of the up-diffused transistors, is provided for down-diffused and up-diffused transistors (for example T4, T1) (Figure 2). <IMAGE>
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申请公布号 |
DE3308331(A1) |
申请公布日期 |
1984.09.20 |
申请号 |
DE19833308331 |
申请日期 |
1983.03.09 |
申请人 |
ENGL,WALTER L.,PROF.DR.RER.NAT. |
发明人 |
ZDEBEL,PETER,DIPL.-ING. |
分类号 |
H01L21/74;H01L27/082;H01L27/102;(IPC1-7):H01L27/04;G11C17/00;H01L21/72;H03K19/08 |
主分类号 |
H01L21/74 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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