| 摘要 |
PURPOSE:To prevent a master mask from being generated in an erroneous state by forming an inspecting mark for displaying the surface and the rear side of a picture, the direction, and a discrimination of white or black of a pattern, on a picture area of one chip portion of a photomask. CONSTITUTION:An inspecting mark 11 for confirming a discrimination of the surface or the rear side of a picture, the direction on the plane, and a discrimination of white or black of a pattern for constituting the picture is formed on a chip area 12 on a photomask. As for the mark 11, that which is not symmetrical and not a point symmetry either is used, and in this case, a character of F is used. This mark 11 is formed simultaneously when a picture data is generated by a CAD, and when generating a master mask from a reticle, whether the state is correct or not can be confirmed by taking a glance at this mark 11. Therefore, it is prevented that the master mask is generated in an erroneous state. |
