发明名称 INITIATOR SYSTEM FOR RADIATION CURABLE COMPOSITIONS, RADIATION CURABLE COMPOSITIONS CONTAINING SUCH AN INITIATOR SYSTEM, A PROCESS FOR CURING SAID COMPOSITIONS AND PRODUCTS COVERED THEREWITH
摘要 In an initiator system are incorporated: a) a compound of the formula: <CHEM> where R1 = H or a substituted or unsubstituted alkyl group having 1 to 18 carbon atoms, an alkenyl group having 2 to 18 carbon atoms, a cycloalkyl or cycloalkenyl group having 5 to 8 carbon atoms, a substituted or unsubstituted aryl group having 6 to 20 carbon atoms, a furfuryl group or the group <CHEM> where Y represents a methyl group and Z an alkyl group having 2 to 4 carbon atoms or Y and Z together form a 1,3- or 1,4- alkylene group having 3 or 4 carbon atoms which is substituted or not with an alkoxy group having 1 to 4 carbon atoms; R2 = a substituted or unsubstituted alkyl group or alkenyl group having 4 to 20 carbon atoms, a cycloalkyl group or cycloalkenyl group having 5 to 8 carbon atoms, an alkaryl group having 4 to 16 carbon atoms in the alkyl group or a furfuryl group; R3 and R4 may be the same of different and represent a hydrogen, a chlorine or a bromine atom or a phenyl group, a substituted or unsubstituted alkyl group or alkoxy group having 1 to 4 carbon atoms, or a dialkyl amino group of which the alkyl groups have 1 to 4 carbon atoms and may be substituted with a hydroxyl group, and b) a synergistic amount of Na, K and/or Li-salt of an organic acid that is compatible with the curable compositions; and optionally some amount of solvent c for component b. The initiator system cures rapidly and has good storage stability.
申请公布号 DE3165499(D1) 申请公布日期 1984.09.20
申请号 DE19813165499 申请日期 1981.03.26
申请人 AKZO N.V. 发明人 HAGEMAN, HENDRIK JAN;DE KLEIN, WILLEM JAN;GIEZEN, EGENIUS ARNOLDUS
分类号 C08F2/00;C08F2/50;C09D4/00;G03C1/73;G03F7/028;(IPC1-7):C08F2/50;G03C1/68 主分类号 C08F2/00
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