| 摘要 |
PURPOSE:To prepare the titled composition having high rate of photosetting and excellent impact resistance and nail scratch resistance, by compounding a polyvalent epoxy resin with specific amount of a compound containing unsaturated double bond and hydroxyl group, and adding a specific component such as triaryl sulfonium complex, etc. CONSTITUTION:The objective composition is prepared by compounding (A) 40- 90wt%, preferably 50-80wt% of a polyvalent epoxy resin (e.g. bisphenol A diglycidyl ether) with (B) 60-10wt%, preferably 20-50wt% (A+B is 100wt%) of a compound containing unsaturated double bond and hydroxyl group (e.g. acrylic acid ester of trifunctional polypropylene glycol), (C) a triaryl sulfonium complex salt (preferably triaryl sulfonium hexafluoroantimonate, and its amount is 1- 3wt% of A+B) and (D) a polymerization initiator generating radicals with light or heat (e.g. benzoin).
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