| 摘要 |
PURPOSE:To enable formation of fine holes with high precision and high density in a shadow mask for electron beams to pass througn, by using an amorphous alloy as the material of the shadow mask. CONSTITUTION:An amorphous alloy is used as the material for a shadow mask, in which the holes for electron beams to pass through are formed by etching. Since the material of the shadow mask is of an amorphous alloy having no crystalline structure, the etched directions on the microscopic structures are completely at random. As a result, the etching direction is macroscopically uniform and the hole for the electron beam to pass through is formed perpendicularly to the etching surface. Thus, a shadow mask can be provided with fine holes having precision and high density for electron beams to pass therethrough. |
