Bath and process for the electrodeposition of chromium

摘要

A trivalent chromium electroplating solution containing trivalent chromium ions, a complexant, a buffer and thiocyanate ions. The thiocyanate is of a molar concentration which is lower than the molar concentration of the chromium ions, and the chromium ion concentration being lower than 0.1 M. The stability constant, K1, of the solution's chromium complex is in the range 108<K1<1012M-1.