| 摘要 |
PURPOSE:To obtain a photosensitive body superior in resistance to repeated uses and high in resolution by forming a barrier layer and a layer contg. highly concd. acceptor type impurities on the surface side of an amorphous Si layer. CONSTITUTION:A photosensitive layer is made of an amorphous layer composed essentially of Si and contg. H or halogen. A barrier layer and a layer contg. highly concd. acceptor type impurities are formed on the surface side of the amorphous layer. As the barrier layer, an oxide layer, a nitride layer, a carbide layer, a boron nitride layer, and a layer of a mixture of them are used. |
