| 发明名称 |
MEANS FOR PROVIDING UNIFORM ILLUMINATION TO A LIGHT SENSITIVE ELEMENT |
| 摘要 |
<p>MI-2813 MEANS FOR PROVIDING UNIFORM ILLUMINATION TO A LIGHT SENSITIVE ELEMENT In a ring field projection optical system for imaging a mask on a wafer the illumination source has readily adjustable means for obtaining uniform exposure along the length of the arcuate zone of illumination.</p> |
| 申请公布号 |
CA1174493(A) |
申请公布日期 |
1984.09.18 |
| 申请号 |
CA19820398356 |
申请日期 |
1982.03.15 |
| 申请人 |
PERKIN-ELMER CORPORATION (THE) |
发明人 |
ENGELBRECHT, OREST;MARKLE, DAVID A. |
| 分类号 |
G03B27/32;G03B27/50;G03F7/20;(IPC1-7):G03B27/72 |
主分类号 |
G03B27/32 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
