| 摘要 |
PURPOSE:To improve the resolution (gamma value) of a positive type photoresist composition contg. a quinone diazide compound and m-cresol-formaldehyde novolak resin by using novolak resin showing a specified nuclear magnetic resonance spectrum as said novolak resin. CONSTITUTION:m-Cresol-formaldehyde novolak resin having >=0.15 N value represented by the equation is used. In the equation, a, b, c and d are areal values of peaks at about 112.5pp, about 115.5pp, about 116.7pp and about 119.6pp in the <13>C-NMR (nuclear magnetic resonance) spectrum of a soln. of the novolak resin in dimethylsulfoxide. A proper amount of epoxy resin having two or more epoxy groups per one molecule, a photosensitive agent, a dye, etc. are added to a positive type photoresist composition contg. said novolak resin and a quinone diazide compound in (1:1)-(6:1). The epoxy resin is added so as to improve the adhesive strength. A resist having a high gamma value, that is, high resolution can be obtd. |
