发明名称 BORON NITRIDE FILM AND ITS MANUFACTURE
摘要 PURPOSE:To obtain a boron nitride film having superior electro-insulating and thermal conductive characteristics by heating, evaporating a boron compound, spouting, ionizing the boronic vapor into a nitrogeneous atmosphere and dashing it to a substrate surface. CONSTITUTION:Boron oxide is filled in a crucible 1 and a gaseous mixture G of e.g. nitrogen is introduced in a vacuum vessel through a pipe 13 to keep <=10<-2> Torr pressure in the vacuum vessel. A heating device 4 is operated and the boron oxide 3 is heated to evaporate. The vapor 3a is spouted from a nozzle 2 to make a vapor-stream 3b directed to a base 11. The vapor-stream 3b is entered to an ionizing chamber 6 and at least a part of it is ionized there. An ionized cluster is moved further to the substrate 11 with a neutral cluster and the gaseous mixture on a passage and dashed to the substrate surface 11 when a shutter is opened. The formed cluster is diffused on said surface 11 by dividing into individual atoms by the surface migration effect to form a boron nitride film 16 on said surface 11.
申请公布号 JPS59156998(A) 申请公布日期 1984.09.06
申请号 JP19830030792 申请日期 1983.02.28
申请人 FUTABA DENSHI KOGYO KK 发明人 MORIMOTO KIYOSHI;TAKAGI TOSHINORI
分类号 C30B23/08;C23C14/00;C30B25/06;C30B29/38;H01L21/20;H01L21/203;H01L21/205;H01L21/314;H01L23/36;H01L23/373;H01L27/00;H01L27/12 主分类号 C30B23/08
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