| 摘要 |
PURPOSE:To obtain a color panel having good quality in a short production stage by using a photoresist of a negative type for partial etching of transparent electrodes. CONSTITUTION:A transparent electrode 11 of ITO is formed on a transparent substrate 1 and a photosensitive resin 16 of a negative type is uniformly coated thereon and is dried. A relief pattern 12 is formed by a mask exposing method through a mask 17. The resin 16 which is satisfactorily dyeable even if the film thickness is decreased and with which a substantial color density is obtainable is obtd. by using a peptide resin formed by hydrolyzing the collagen of a terrestrial mammal. The photosensitive resin formed by adding 10-30wt% chromic anhydride or dichromate to such peptide resin is used as an essential component for the pattern 12. The exposed parts of the transparent conductive film 11 are etched to form transparent electrodes 2. A mask resist 13 is formed thereon except the picture elements to be dyed and the substrate is dipped in a red dye soln. to dye and fix the resin and thereafter the resist 13 is stripped. Green and blue patterns are similarly formed, by which the color panel having good quality is obtd. |
