| 摘要 |
A method for controlling the slope of the edge gradient of a layer of vapor deposition material onto a substrate from an evaporation source of vapor deposition material comprising the steps of forming a flux of vapor deposition material having an effective source cross-sectional area and shape from an evaporation source of a vapor deposition material located at a known position, indexing a deposition mask having a plurality of apertures extending therethrough such that the mask is in a spaced relationship from the source defining a source-to-mask distance and positioned in the flux of vapor deposition material to permit the flux of vapor deposition to pass through the apertures, registering a substrate in a spaced relationship from the deposition mask defining a mask-to-substrate distance to permit the flux of the vapor deposition material passing through the apertures in the deposition mask to impinge onto the substrate forming a layer of vapor deposit material thereon, controlling at least one of the effective source cross-sectional area and shape of the flux of vapor deposition material, position of the evaporation source of a deposition material relative to the deposition mask, the magnitude of the substrate-to-mask distance and the magnitude of the mask-to-source distance to produce an edge onto the deposited layer of the vapor deposition material having the desired gradient is shown. A product produced by the process is also shown.
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