| 摘要 |
PURPOSE:To enable any times of registration with each photomask by covering the register mark for the photomask with a transparent UV-cut film larger than the width of the register mark on the substrate side. CONSTITUTION:The 1st conductive layer and a register mark 5 are patterned on a substrate 4 and after an insulating layer and the 2nd conductive layer are formed thereon, a photoresist 6 of a positive type is deposited astop the same. On the other hand, a register mark 8 is formed on a photomask substrate 7, and a transparent UV-cut film 9 exhibiting large attenuation to the light having the effective photosensitive wavelength of the photoresist 6 is deposited thereon at the width larger than the mark 5. After the substrate 4 and the photomask are registered on the basis of the marks 5, 8, the substrate 7 is exposed with UV light from above and is developed. |
