| 摘要 |
In a glow discharge coating appts., at least one substrate or substrate holder is electrically isolated and spaced from at least one target which is formed at least partially from a grid of source material, pref. an expanded material. In a glow discharge coating process, employing the above appts., a high energy plasma is formed at the target and target material is sputtered from the internal surfaces of the target and deposited on the substrate.
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