| 摘要 |
PURPOSE:To increase the density of flux for irradiation field as well as to perform a mass production of a submicron pattern transfer by a method wherein, when soft X-rays are generated by injecting a beam from an electron gun in the rotary electrode provided in a vacuum chamber, the electron gun is provided outside the vacuum chamber, and the crossing angle of the straight line representing the irradiating direction of the beam and the line connecting the center of the irradiation field of soft X-ray and the X-ray source is set at 90 deg. or above. CONSTITUTION:An atmospheric chamber 8 wherein a mask 3 and a substrate 4 are placed is installed at the lower part of the frame 11 which constitutes an X-ray exposing device, and a vacuum chamber 12 to be used for a soft X-ray generating device 10 is provided at the upper part of the frame 11. A rotary paired cathode 28 is provided inside said vacuum chamber 12, its illuminating face 29 is formed in tapered shape, it is inclinedly formed to the mask 3 and the substrate 4, and an X-ray transmitting window 14 made of Be with variable thickness is provided between the mask 3 and the substrate 4. Also, an electron gun 31 is arranged outside the vacuum chamber 12, and the focusing diameter and the shape of the beam 9 sent from a cathode 32 are changed using an electron lens 35. As the titled device is constituted as above, the crossing angle beta of the irradiating direction of the beam 9 and the center line C of the soft X-ray 41 to be made incident on the mask 3 side from the cathode 28 can be selected larger than 90 deg.. |
