| 摘要 |
PURPOSE:To form a flat surface free from a working strain by chemically polishing the surface of an InSb compound semiconductor with a specified polishing soln. CONSTITUTION:An InSb compound semiconductor useful as an infrared-ray detecting element, a magneto-resistance element or the like is chemically polished with a soln. contg. lactic acid and hydrogen peroxide as a polishing soln. A flat surface free from working strain is easily formed. |
