| 摘要 |
PURPOSE:To improve pattern matching accuracy and keep small displacement of pattern by providing a magnification control means which compensates for the size of individual patterns by fine adjustment of reduction magnification of image, on the occasion of delineating patterns through reduction and transfer of image by the step and repeat system. CONSTITUTION:A control mechanism 8 which fine-adjusts a reduction magnification of image by changing bodytube length is provided at the interim area of bodytube 1. As a control mechanism 8, for example, a piezo element which changes thickness when a voltage is applied or a motor is used. A size of pattern focused on the mask 3 placed on the main table 4 can be compensated by changing bodytube length as describeda above. With a plan view of mask 3 delineated, first a pattern is transferred on the mask 3 by the step and repeat system. Next, the mask 3 sows thermal deformation by the heat treatment. A contraction coefficient of mask 3 by thermal deformation should be previously obtained and transfer magnification is changed by the control mechanism 8 based on such contraction coefficient.
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