| 摘要 |
PURPOSE:To improve sensitivity by incorporating a photosensitive high polymer soln. consisting of a polymer or a copolymer having specific repetitive units and a compd. selected from the group of a benzoic acid compd., anthraquinone compd., aromatic nitro compd. and alicyclic amine compd. CONSTITUTION:This compsn. contains a photosensitive high polymer soln. consisting of a polymer or a copolymer having the repetitive units expressed by the formula and a compd. selected from the group consisting of a benzoic acid compd., anthraquinone compd., aromatic nitro compd. and alicyclic amine compd. The org. solvent for forming said photosensitive high polymer soln. is enumerated by alcohol, ketone, etc., and the additive exhibiting a sensitizing effect is enumerated by alcohol such as methyl cellosolve, ethyl cellosolve, ketone such as acetone, methyl ethyl ketone, ester such as ethyl acetate, n-propyl acetate, n- amyl acetate, isoamyl acetate or ethyl cellosolve acetate, a heterocyclic compd. such as tetrahydrofuran or pyrrole, an arom. compd. such as benzene, toluene, xylene or monochlorobenzene, and a alicyclic compd. such as cyclohexane. X1 in the formula denotes H, halogen, an alkyl halide group of C1-4, an alkyl group of C1-4, X2 denotes halogen or an alkyl halide group of C1-4, and further R denotes an arom. ring or heterocyclic ring. |
