METHOD AND DEVICE FOR THIN FILM FABRICATION

摘要

PURPOSE:To fabricate a thin film having uniform quality by irradiating the substrate with electron beam and scanning it so as to vapor-deposit an evaporating substance on the substrate. CONSTITUTION:A hydrogen-gas introducing pipe 4 is connected to a bell-jar 1 connected to a vacuum pump through an exhaust way 5. Scanning-type electron beam generators 8A and 8B are arranged symmetrically under a vapor-deposition substrate 2 arranged in the bell-jar 1. In the bell-jar 1, an evaporation source 3 using silicon as an evaporating substance is arranged oppositely to the substrate 2. The generators 8A and 8B are driven to scan the electron beam from the generators in a manner the beam goes toward the substrate 2 thereby heating the evaporation source 3 and forming the thin film consisting of amorphous silicon including hydrogen on surface of the substrate 2.