ZIRCONIUM OXIDE COMPOSITION FOR VAPOR DEPOSITION AND SPUTTERING AND PRODUCTION OF OPTICAL THIN FILM USING SAID COMPOSITION

摘要

PURPOSE:To suppress optical heterogeneity and to improve hardness by using a compsn. consisting of zorconium oxide as well as yttrium oxide and titanium oxide for an evaporating source or sputtering source. CONSTITUTION:A compsn. consisting of zirconium oxide, 0.5-50wt% yttrium oxide by the weight of said zirconium and 0.5-160wt% titanium oxide is used for an evaporating source or sputtering source and a thin film is formed on the surface of a base body by vacuum evaporation or sputtering.