| 发明名称 |
APPARATUS AND PROCESS FOR PLASMA-ETCHING |
| 摘要 |
End point detection in developing photoresist is accomplished by monitoring the output of a photodetector and sensing a plateau in the output. |
| 申请公布号 |
DE2967121(D1) |
申请公布日期 |
1984.08.23 |
| 申请号 |
DE19792967121 |
申请日期 |
1979.12.04 |
| 申请人 |
MOTOROLA, INC. |
发明人 |
KELLER, JED V. |
| 分类号 |
H01L21/302;G01N21/76;H01J37/32;H01L21/3065;(IPC1-7):H01L21/30;C23F1/00 |
主分类号 |
H01L21/302 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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