发明名称 PREPARATION OF THIN FILM OF METAL
摘要 PURPOSE:In vacuum metallizing, to form rapidly a stable thin film of metal without making a substrate consisting of a high polymer material develop heat distortion, thermal decomposition, and wrinkle, by applying a potential difference to the space between the thin film of metal to be formed and a cylindrical can. CONSTITUTION:In forming directly a thin film of metal on the substrate 1 consisting of a high polymer material running along the outer peripheral face of the cylindrical can 2 by vacuum metallizing, for example, the metal roller 7 is set between the cylindrical can 2 and the winding roll 4, a potential difference is applied to a space between the formed thin film 6 of metal and the cylindrical can 2 by the electric source 8, to form a thin film of metal. EFFECT:The substrate 6 is stuck on the cylindrical can 2 by electrostatic attraction, and protected from thermal damage. A metallized thin film of metal can be used as an electode, and the surface of substrate is not required to have electrical conductivity previously.
申请公布号 JPS59147023(A) 申请公布日期 1984.08.23
申请号 JP19830020613 申请日期 1983.02.10
申请人 MATSUSHITA DENKI SANGYO KK 发明人 UENO FUMIAKI;SUGITA RIYUUJI;HONDA KAZUYOSHI
分类号 C23C14/14;C08J7/04;C23C14/56 主分类号 C23C14/14
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