| 摘要 |
PURPOSE:To prevent the diffusion of plasma toward a substrate with simple constitution and to enable access of the substrate to a light source part in a titled device of a built-in electric discharge type by discharging a screen-like anode on the side of a discharge space near the substrate and a cathode on the side further therefrom. CONSTITUTION:A photoreactive gas is supplied through holes 11 into a cylindrical vessel 1 and is discharged through a hole 12. A substate 4 is supported in a support 13 contg. a heater and a reaction space 5 is formed under the support. The part beneath the same is discharge space 3. An anode 6 of relatively coarse mesh which is formed into a circular shape by weaving W wire rods to the screen and does not hamper the passage of UV light is provided at the boundary between the spaces 3 and 5. A cathode 7 is provided in the bottom of the vessel 1 and a heater 8 contacts the bottom surface thereof. When a voltage is impress between the electrodes 6 and 7, plasma discharge is accomplished in a perpendicular direction and the substrate 4 is irradiated with generated UV light. For example, amorphous Si is thus deposited by evaporation on the substrate 4. |
