| 摘要 |
PURPOSE:To enable to prevent the adhesion of flakes by a method wherein the table on which a wafer and the like will be placed and fixed is provided in such a manner that it will be horizontally rotated around a rotary shaft. CONSTITUTION:After a bell jar main body 1 has been brought down to the prescribed position by inverting a guide pole 16, a bell jar cover 21 is turned reversely at 180 deg. by driving an inverting motor 40 normally, and the water attaching surface of the table 34 is faced upward. Then, the bell jar cover 21 is turned reversely at 180 deg. by reversing the inverting motor 40, the wafer attaching surface of the table 34 is faced downward, and the table 34 and the wafer 33 are heated up using a heater 35. At the same time, the air in a reaction chamber is exhausted from an exhaust tube 13, and the reaction gas such as SiH4, NH3, N2 and the like is supplied into the reaction chamber from a nozzle 11. Subsequently, the table 34 is revolved at a low speed by driving a motor 30, and a silicon film is formed on the surface of the wafer 33 while a voltage is applied between the table 34 and an electrode 2 and plasma is being generated there. |
