| 摘要 |
<p>Module (10) for processing of substrates (20), comprising at least a series of transporters (12) for a floating transport of said substrates (20) in the passage (18) thereof, said transporters (12) successively arranged in direction of movement of said substrates (20), in between said transporters (12) the location of slots (102) of the processing chamber (22) and whereby discharge channels (72), (74), together with discharge compartments (76), (78), discharge ducts (38), (40) and high vacuum pumps (42), (44) establish a removal in sideward direction of the greater part of gaseous transport medium, escaping from said transporters (12). </p> |
