| 摘要 |
PURPOSE:To obtain improved patternability capable of forming a solder mask or the like high in density even on a resin face by forming on a base film a layer contg. a compd. absorbing light of >=400nm wavelength. CONSTITUTION:In a photosensitive element comprising a photosensitive layer, a base film, and when needed, a protective film, the base film is coated with a layer contg. a compd. having high absorptivity in >=400nm wavelengths and low absorptivity in <=400nm wavelengths, such as ferrocene, p-dimethylaminostearylthiazole, 2,4,6-triphenylpyrylium salt, or 2,6-bis(p-dimethylaminobenzoin)cyclohexanone. As the base film, a polyester film is used, and as a cover film, a PE and PP film, etc. are used. |
