发明名称 Method of fabricating a pellicle cover for projection printing system
摘要 The invention is directed to a method of fabricating a pellicle cover assembly for use in a projection printing system for forming an image on a radiation sensitive wafer, the method comprising the steps of applying a gold film onto the surface of a wafer, applying a polymer film onto the gold film surface, curing the polymer film, adhering a support ring to the polymer film, cutting through the polymer and gold films between the ring and wafer edges to expose the wafer surface, peeling the ring off the wafer and etching off the gold film.
申请公布号 US4465759(A) 申请公布日期 1984.08.14
申请号 US19830466268 申请日期 1983.02.14
申请人 THE PERKIN-ELMER CORPORATION 发明人 DULY, DAWN L.;WINDISCHMANN, HENRY;BUCKLEY, W. D.
分类号 H01L21/30;G03F1/14;G03F7/20;H01L21/027;(IPC1-7):G03C5/00 主分类号 H01L21/30
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