发明名称 METHOD AND DEVICE FOR PRODUCING THIN FILM
摘要 PURPOSE:To form a thin film of the resulting product of thermal decomposition having high quality without changing the structural function of a base body by ejecting gaseous flow of a reactive gaseous material to a substrate while irradiating a laser beam thereto and moving at the same time the substrate two- dimensionally. CONSTITUTION:A laser beam projector 3 is fixed above a sample base 2 provided with a two-dimensional driving mechanism 1, and a laser beam is made incident perpendicularly to the center A of the substrate 4 on the base 2. A reactive gaseous material is projected as fine and high velocity gaseous flow from pencil nozzles 5, 5 toward the incident point A. The base 2 is manipulated two-dimensionally in this state to form film surface and thin film pattern. All the points on the substrate 4 are heated instantaneously only on the extremely thin surface layer when they pass the irradiating point of the laser beam according to the movement in X-, Y directions and are quickly cooled after the passage thereof. The stage for manufacturing the thin film is thus executed at a lower temp. and the thin film having high quality and adhesion strength is formed.
申请公布号 JPS59140366(A) 申请公布日期 1984.08.11
申请号 JP19830247610 申请日期 1983.12.27
申请人 KOGYO GIJUTSUIN (JAPAN) 发明人 TABATA OSAMU;KIMURA SABUROU
分类号 C23C16/04;C23C16/48 主分类号 C23C16/04
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