| 摘要 |
PURPOSE:To form a protective film and/or a wired layer insulating material generating no defective galvanic corrosion for a prolonged period, by applying and curing a silicone resin solution on a substrate. CONSTITUTION:Tetraalkoxysilane is hydrolyzed and polycondensed into a polydialkoxysilane prepolymer (PDAS) in the presence of hydrogen chloride. The PDAS is dissolved in an organic solvent of the boiling point of 110 deg.C or above and the obtained solution is brought to a state of a temperature of 40 deg.C or below and a pressure of 5mm.Hg or below to expel hydrogen chloride. The obtained PDAS solution, alone or in admixture with a polysilsesquioxane prepolymer, is applied on a metallic film on a garnet substrate and cured, thus forming an insulating material and/or a protective film made of a silicon resin. Methyl cellosolve acetate, ethyl cellosolve acetate, n-butyl alcohol or a mixed organic solvent containing either of them is used as the organic solvent. |
